Browsing Presentations by imec author "0910cd803a555ff37cbb3478b7a1e20fbc642fbb"
Now showing items 1-12 of 12
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28nm pitch of line/space pattern transfer into silicon substrates with chemo-epitaxy directed self-assembly (DSA) process flow
Chan, BT; Tahara, Shigeru; Parnell, Doni; Rincon Delgadillo, Paulina; Gronheid, Roel; de Marneffe, Jean-Francois; Xu, Kaidong; Nishimura, Eiichi; Werner, Thilo (2013) -
Development of a novel wafer probe for in-situ measurements
El Otell, Ziad; Marinov, Daniil; Bowden, Mark; Samara, Vladimir; de Marneffe, Jean-Francois; Verdonck, Patrick; Braithwaite, Nicholas (2013) -
Etch challenges on single and dual SOI fins patterning for CFET at 25nm fin pitch
Chan, BT; Boemmels, Juergen; Ryckaert, Julien; Zhang, Liping; Tao, Zheng; Altamirano Sanchez, Efrain; de Marneffe, Jean-Francois (2019) -
Growth of multilayer transition-metal dichalcogenide layers by high temperature sulfurization in H2S
Heyne, Markus; Nuytten, Thomas; Meersschaut, Johan; Chiappe, Daniele; Caymax, Matty; de Marneffe, Jean-Francois; Radu, Iuliana (2015) -
Integration of SPER and FUSI in a pFET
Severi, Simone; Pawlak, Bartek; Veloso, Anabela; Duffy, Ray; Kottantharayil, Anil; Lauwers, Anne; Henson, Kirklen; de Marneffe, Jean-Francois; Eyben, Pierre; Vandervorst, Wilfried; De Meyer, Kristin; Jurczak, Gosia; Biesemans, Serge (2004) -
Molecular glass resists for all-dry high-resolution scanning probe lithography
Neuber, Christian; Cooke, Mike; Despont, Michel; Durig, Urs; Kastner, Markus; Knoll, Armin; de Marneffe, Jean-Francois; Rangelow, Ivo; Rawlings, Colin; De Schepper, Peter; Schmidt, Hans-Werner; Strohriegl, Peter (2013) -
Paths towards low-damage etching of highly porous organo-silicate low-k dielectrics
de Marneffe, Jean-Francois; Zhang, Liping; Watanabe, Mitsuhiro; yatsuda, koichi; Maekawa, Kaoru; Cooke, Mike; Goodyear, Andy; Leroy, Floriane; Tillocher, Thomas; Lefaucheux, Philippe; Dussart, Remi; Dussarat, Christian; Baklanov, Mikhaïl (2016) -
Residue formation in MHM-based low-k etch
Goossens, Danny; de Marneffe, Jean-Francois; Conard, Thierry; Hendrickx, Dirk; Struyf, Herbert; Boullart, Werner (2008) -
Resist process development for the EUV alpha demo tool at IMEC
Goethals, Mieke; Niroomand, Ardavan; Van Roey, Frieda; Hermans, Jan; Lorusso, Gian; Baudemprez, Bart; Pollentier, Ivan; de Marneffe, Jean-Francois; Demuynck, Steven; Jonckheere, Rik; Ronse, Kurt (2008) -
Selective deposition of WS2 by a prepatterned dacrificial Si layer
Heyne, Markus; Delabie, Annelies; Caymax, Matty; Radu, Iuliana; de Marneffe, Jean-Francois; De Gendt, Stefan (2016) -
Status of 157nm Lithography Development
Jonckheere, Rik; Hermans, Jan; Goethals, Mieke; De Bisschop, Peter; Eliat, Astrid; Van Den Heuvel, Dieter; Van Roey, Frieda; Beckx, Stephan; Wouters, Johan M. D.; de Marneffe, Jean-Francois; Ronse, Kurt (2003) -
Sulfurization of metallic and oxidized molybdenum thin films
Heyne, Markus; Chiappe, Daniele; Meersschaut, Johan; Nuytten, Thomas; Conard, Thierry; Bender, Hugo; Huyghebaert, Cedric; Radu, Iuliana; de Marneffe, Jean-Francois; Neyts, Erik C.; De Gendt, Stefan (2016)