Browsing Presentations by imec author "0e8ff9523ab67b171e77c5ca50b6beb595acb3c2"
Now showing items 1-9 of 9
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ALD high-K and metal gate solutions
Absil, Philippe; Ragnarsson, Lars-Ake; Hoffmann, Thomas Y.; Biesemans, Serge (2009) -
Challenges in FEOL for 45nm and beyond
Biesemans, Serge (2004) -
Crystallization study of thin ZrO2 ALD films on Al203 and on TiN for DRAM MIMCAP applications
Pawlak, Malgorzata; Menou, Nicolas; Wang, Xin Peng; Dilliway, G.; Pierreux, D.; Fischer, P.; Vos, Rita; Hoyer, R.; Kittl, Jorge; Wouters, Dirk; Biesemans, Serge (2008) -
Doubling or quadrupling MuGFET Fin integration scheme with higher pattern fidelity, lower CD variation and higher layout efficiency
Rooyackers, Rita; Augendre, Emmanuel; Degroote, Bart; Collaert, Nadine; Nackaerts, Axel; Dixit, Abhisek; Vandeweyer, Tom; Pawlak, Bartek; Ercken, Monique; Kunnen, Eddy; Dilliway, Gabriela; Leys, Frederik; Loo, Roger; Jurczak, Gosia; Biesemans, Serge (2007) -
Implementation of high-K and metal gate materials for the 45nm node and beyond: gate patterning development
Beckx, Stephan; Demand, Marc; Locorotondo, Sabrina; Henson, K.; Claes, Martine; Paraschiv, Vasile; Shamiryan, Denis; Jaenen, Patrick; Boullart, Werner; De Gendt, Stefan; Biesemans, Serge; Vanhaelemeersch, Serge; Vertommen, Johan; Coenegrachts, Bart (2004) -
Integration of SPER and FUSI in a pFET
Severi, Simone; Pawlak, Bartek; Veloso, Anabela; Duffy, Ray; Kottantharayil, Anil; Lauwers, Anne; Henson, Kirklen; de Marneffe, Jean-Francois; Eyben, Pierre; Vandervorst, Wilfried; De Meyer, Kristin; Jurczak, Gosia; Biesemans, Serge (2004) -
Materials and device architectures for sub-22nm technologies
Biesemans, Serge (2010) -
Scaling challenges for sub-45nm technologies
Biesemans, Serge (2005)