Browsing Presentations by imec author "50c17e127bfb958141fb3ee716d6d132fa9e9245"
Now showing items 1-9 of 9
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Characterization and mitigation of 3D mask effects in EUV lithography
Erdmann, Andreas; Xu, Dongbo; Evanschitzky, Peter; Luong, Vu; Philipsen, Vicky; Hendrickx, Eric (2016) -
Evaluation of optical material parameters for advanced absorbers on EUV masks
Scholze, Frank; Laubis, Christian; Philipsen, Vicky; Luong, Vu; Edrisi, Arash; van de Kruijs, Robbert (2016) -
IMEC lithography activities for 45nm node and beyond: mask impact
Philipsen, Vicky; De Bisschop, Peter; Hendrickx, Eric; Wiaux, Vincent; Vandenberghe, Geert; Jonckheere, Rik (2007) -
Impact of an etched EUV mask black border on imaging and overlay
de Kruif, Rob; Davydova, Natalia; Connolly, Brid; Fukugami, Norihito; Lammers, Ad; Philipsen, Vicky; Kondo, Shinpei; Van Setten, Eelco; Vaenkatesan, Vidya; Zimmerman, John; Harned, Noreen (2012) -
Impact of mask stack on high NA EUV imaging
Philipsen, Vicky; Hendrickx, Eric; Jonckheere, Rik; Vandenberghe, Geert; Davydova, Natalia; Fliervoet, Timon; Neumann, Jens Timo (2012) -
Improving EUV imaging at tighter pitch using a tuned-ML mask stack
Wood, Obert; Philipsen, Vicky; Soltwisch, Victor; Raghunathan, Sudhar; Verduijn, Erik; Hendrickx, Eric; Scholze, Frank; Mangat, Pawitter (2014) -
Mask is key to unlock full EUVL potential
Philipsen, Vicky (2021) -
Reticle terminology and metrology needs for advanced 193nm and 157nm lithography
Jonckheere, Rik; Ronse, Kurt; Philipsen, Vicky; Leunissen, Peter (2003) -
Test of vector effect emulation of the AIMSTM45-193i
De Bisschop, Peter; Philipsen, Vicky; Birkner, Robert; Richter, Rigo; Scheruebl, Thomas (2007)