Browsing Presentations by author "Xu, Kaidong"
Now showing items 1-12 of 12
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15nm half-pitch patterning: EUV + SELF-aligned double patterning
Versluijs, Janko; Souriau, Laurent; Hellin, David; Orain, Isabelle; Kimura, Yoshie; Kunnen, Eddy; Dekkers, Harold; Shi, Xiaoping; Albert, Johan; Wiaux, Vincent; Xu, Kaidong (2012) -
28nm pitch of line/space pattern transfer into silicon substrates with chemo-epitaxy directed self-assembly (DSA) process flow
Chan, BT; Tahara, Shigeru; Parnell, Doni; Rincon Delgadillo, Paulina; Gronheid, Roel; de Marneffe, Jean-Francois; Xu, Kaidong; Nishimura, Eiichi; Werner, Thilo (2013) -
A force study in brush scrubbing
Xu, Kaidong; Vos, Rita; Vereecke, Guy; Doumen, Geert; Mertens, Paul; Heyns, Marc (2004) -
Advanced wafer surface cleaning technology
Mertens, Paul; Vos, Rita; Vereecke, Guy; Arnauts, Sophia; Bearda, Twan; De Waele, Rita; Eitoku, Atsuro; Fyen, Wim; Geckiere, J.; Hellin, David; Holsteyns, Frank; Kesters, Els; Claes, Martine; Kenis, Karine; Kraus, Harald; Malhouitre, Stephane; Lee, Kuntack; Kocsis, Michael; Onsia, Bart; Garaud, Sylvain; Rip, Jens; Snow, Jim; Teerlinck, I.; Van Hoeymissen, Jan; Barbagini, Francesca; Xu, Kaidong; Paraschiv, Vasile; De Gendt, Stefan; Mannaert, Geert; Heyns, Marc (2004) -
Cleaning of nanoparticles in semiconductor manufacturing
Vereecke, Guy; Arnauts, Sophia; Doumen, Geert; Eitoku, Atsuro; Fransaer, J.; Fyen, Wim; Holsteyns, Frank; Kenis, Karine; Lee, Kuntack; Lux, Marcel; Snow, Jim; Vinckier, Chris; Vos, Rita; Xu, Kaidong; Mertens, Paul (2004) -
Correlation between haze of the wafer and particle-count on wafers: a new approach to monitor nano-sized particles
Xu, Kaidong; Vos, Rita; Vereecke, Guy; Lux, Marcel; Fyen, Wim; Holsteyns, Frank; Kenis, Karine; Mertens, Paul; Heyns, Marc; Vinckier, Chris (2002) -
Damage-free removal of nano-sized particles, heading towards a red brick wall
Mertens, Paul; Fyen, Wim; Vereecke, Guy; Xu, Kaidong; Lauerhaas, J.; Holsteyns, Frank; Van Doorne, Patrick; Kesters, Els; Vos, Rita (2003) -
Evaluation of megasonic cleaning for particle removal efficiency and damaging
Vereecke, Guy; Holsteyns, Frank; Xu, Kaidong; Lux, Marcel; Vos, Rita; Mertens, Paul; Loper, S.; Grothe, P. (2003) -
Optimization of cleaning processes for 100 nm and smaller design rules
Xu, Kaidong; Vos, Rita; Holsteyns, Frank; Kenis, Karine; Vereecke, Guy; Mertens, Paul; Heyns, Marc (2001) -
Removal of nano-particles by aerosol spray: effect of droplet size and velocity on cleaning performance
Xu, Kaidong; Pichler, Stefan; Wostyn, Kurt; Cado, Gwenaelle; Gale, Glenn; Dalmer, Michael; Springer, Clement; Mertens, Paul; Bearda, Twan; Gaulhofer, Ernst; Chen, David (2008) -
Removal of particles during dHF-based cleaning recipes
Vos, Rita; Cornelissen, Ingrid; Xu, Kaidong; Lux, Marcel; Fyen, Wim; Meuris, Marc; Mertens, Paul; Heyns, Marc (2000) -
State-of-the art cleaning in semiconductor manufacturing
Mertens, Paul; Arnauts, Sophia; Bearda, Twan; Eitoku, Atsuro; Fyen, Wim; Hellin, David; Holsteyns, Frank; Kesters, Els; Kraus, Harald; Lee, Kuntack; Onsia, Bart; Rip, Jens; Schmidt, H.; Snow, Jim; Teerlinck, Ivo; Vereecke, Guy; Vos, Rita; Xu, Kaidong; Heyns, Marc (2003)