Browsing Presentations by imec author "8732393f67b07512e725114ed9e129719bc408be"
Now showing items 1-3 of 3
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Applying dipole illumination to characterize the imaging performance of 193nm photoresists for the 100nm node
Vleeming, Bert; Heskamp, B.; Finders, Jo; Jaenen, Patrick (2000) -
Implementation of high-K and metal gate materials for the 45nm node and beyond: gate patterning development
Beckx, Stephan; Demand, Marc; Locorotondo, Sabrina; Henson, K.; Claes, Martine; Paraschiv, Vasile; Shamiryan, Denis; Jaenen, Patrick; Boullart, Werner; De Gendt, Stefan; Biesemans, Serge; Vanhaelemeersch, Serge; Vertommen, Johan; Coenegrachts, Bart (2004) -
Sub-32nm half pitch imaging with high NA immersion exposure systems using Double Patterning techniques
Vleeming, Bert; Maenhoudt, Mireille; Quaedackers, John; van der Heijden, Eddy; de Haas, Paul; Uzunbajakau, Siarhei; Meessen, Jeroen; Dicker, Gerald; Finders, Jo; Dusa, Mircea; Jaenen, Patrick; Locorotondo, Sabrina (2007)