Browsing Presentations by imec author "935c9dfd63c5f460aa2807a5ea20cb3b9e4b7144"
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A detailed study of semiconductor wafer drying
Fyen, Wim; Holsteyns, Frank; Bearda, Twan; Arnauts, Sophia; Van Steenbergen, Jan; Doumen, Geert; Kenis, Karine; Mertens, Paul (2004) -
Advanced wafer surface cleaning technology
Mertens, Paul; Vos, Rita; Vereecke, Guy; Arnauts, Sophia; Bearda, Twan; De Waele, Rita; Eitoku, Atsuro; Fyen, Wim; Geckiere, J.; Hellin, David; Holsteyns, Frank; Kesters, Els; Claes, Martine; Kenis, Karine; Kraus, Harald; Malhouitre, Stephane; Lee, Kuntack; Kocsis, Michael; Onsia, Bart; Garaud, Sylvain; Rip, Jens; Snow, Jim; Teerlinck, I.; Van Hoeymissen, Jan; Barbagini, Francesca; Xu, Kaidong; Paraschiv, Vasile; De Gendt, Stefan; Mannaert, Geert; Heyns, Marc (2004) -
Cleaning of nanoparticles in semiconductor manufacturing
Vereecke, Guy; Arnauts, Sophia; Doumen, Geert; Eitoku, Atsuro; Fransaer, J.; Fyen, Wim; Holsteyns, Frank; Kenis, Karine; Lee, Kuntack; Lux, Marcel; Snow, Jim; Vinckier, Chris; Vos, Rita; Xu, Kaidong; Mertens, Paul (2004) -
Developments in cleaning technology for critical layers
Heyns, Marc; Arnauts, Sophia; Bearda, Twan; Claes, M.; Cornelissen, Ingrid; De Gendt, Stefan; Doumen, Geert; Fyen, Wim; Loewenstein, Lee; Lux, Marcel; Mertens, Paul; Mertens, S.; Meuris, Marc; Onsia, Bart; Röhr, Erika; Schaekers, Marc; Teerlinck, Ivo; Van Doorne, Patrick; Van Hoeymissen, Jan; Vereecke, Guy; Vos, Rita; Wolke, K. (2000) -
Evaluation of megasonic cleaning for sub-90-nm technologies
Vereecke, Guy; Holsteyns, Frank; Arnauts, Sophia; Kenis, Karine; Lux, Marcel; Vos, Rita; Snow, Jim; Mertens, Paul (2004) -
Performance of a linear single wafer IPA vapour based drying system
Fyen, Wim; Arnauts, Sophia; Holsteyns, Frank; Doumen, Geert; Vereecke, Guy; Van Steenbergen, Jan; Mertens, Paul (2004) -
Removal of nano-particles and structural damage in megasonic cleaning of silicon wafers
Vereecke, Guy; Holsteyns, Frank; Arnauts, Sophia; Kenis, Karine; Lux, Marcel; Vos, Rita; Snow, Jim; Mertens, Paul (2004) -
State-of-the art cleaning in semiconductor manufacturing
Mertens, Paul; Arnauts, Sophia; Bearda, Twan; Eitoku, Atsuro; Fyen, Wim; Hellin, David; Holsteyns, Frank; Kesters, Els; Kraus, Harald; Lee, Kuntack; Onsia, Bart; Rip, Jens; Schmidt, H.; Snow, Jim; Teerlinck, Ivo; Vereecke, Guy; Vos, Rita; Xu, Kaidong; Heyns, Marc (2003) -
The IMEC-Clean: A clean for advanced CMOS manufacturing
Meuris, Marc; Arnauts, Sophia; Cornelissen, Ingrid; Kenis, Karine; Lux, Marcel; De Gendt, Stefan; Mertens, Paul; Teerlinck, Ivo; Vos, Rita; Loewenstein, Lee; Heyns, Marc; Wolke, K. (2000) -
Validatie van methoden voor metaalcontaminatie analysemethoden op halfgeleidersubstraten
Hellin, David; Rip, Jens; Arnauts, Sophia; Mertens, Paul; De Gendt, Stefan; Vinckier, Chris (2004) -
Vapor phase decomposition - droplet collection. Can we improve the collection efficiency for copper contamination?
De Gendt, Stefan; Huber, A.; Onsia, Bart; Arnauts, Sophia; Kenis, Karine; Knotter, D. M.; Mertens, Paul; Heyns, Marc (1998) -
Vapor phase deposited total X-ray fluorescence as a means to study copper drift diffusion in low-k dielectrics
Lanckmans, Filip; Arnauts, Sophia; Maex, Karen (2001)