Browsing Presentations by imec author "a31afc93f572aac9e2817d0cf31dacb4a890c944"
Now showing items 1-14 of 14
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60 MeV proton irradiation effects on NO-annealed and standard-oxide deep submicron MOSFETs
Simoen, Eddy; Hermans, Jan; Vereecken, Wim; Vermoere, Carl; Claeys, C.; Augendre, Emmanuel; Badenes, Gonçal; Mohammadzadeh, A. (2001) -
BARC process optimatization for hyper NA tools and influence of polarization on CD swing and standing waves
Op de Beeck, Maaike; Hermans, Jan; Foubert, Philippe; Wiaux, Vincent; Hendrickx, Eric (2005) -
Etch tool pressure optimization enabling wafer edge overlay control.
Yildirim, Oktay; van Haren, Richard; Mouraille, Orion; van Dijk, Leon; Hermans, Jan; Kumar, Kaushik; Feurprier, Yannick (2020) -
EUV Lithography in pre-production mode
Hendrickx, Eric; Hermans, Jan; Lorusso, Gian; Foubert, Philippe; Pollentier, Ivan; Goethals, Mieke; Jonckheere, Rik; Vandenberghe, Geert; Ronse, Kurt (2012) -
EUV Lithography in pre-production mode
Hendrickx, Eric; Hermans, Jan; Jonckheere, Rik; Van Den Heuvel, Dieter; Lorusso, Gian; Foubert, Philippe; De Bisschop, Peter; Vandenberghe, Geert; Ronse, Kurt (2012) -
EUV lithography: recent achievements of a maturing technology
Gronheid, Roel; Hendrickx, Eric; Hermans, Jan; Jonckheere, Rik; Goethals, Mieke; Ronse, Kurt (2010) -
Performance update of XT:1250Di
Maenhoudt, Mireille; Van Den Heuvel, Dieter; Cheng, Shaunee; Laidler, David; Hermans, Jan (2005) -
Process evaluation and optimization for EUV manufacturing
Foubert, Philippe; Nafus, Kathleen; Shite, Hideo; Goethals, Mieke; Matsunaga, Koichi; Hermans, Jan; Hendrickx, Eric (2012) -
Readiness of EUV lithography for insertion into manufacturing: The imec NXE:3100 program
Gronheid, Roel; Hendrickx, Eric; Hermans, Jan; Lorusso, Gian; Foubert, Philippe; Pollentier, Ivan; Goethals, Mieke; Jonckheere, Rik; Vandenberghe, Geert; Ronse, Kurt (2012) -
Resist process development for the EUV alpha demo tool at IMEC
Goethals, Mieke; Niroomand, Ardavan; Van Roey, Frieda; Hermans, Jan; Lorusso, Gian; Baudemprez, Bart; Pollentier, Ivan; de Marneffe, Jean-Francois; Demuynck, Steven; Jonckheere, Rik; Ronse, Kurt (2008) -
Shadowing effect compensation
Lorusso, Gian; Kim, Insung; Baudemprez, Bart; Myers, Alan; Hermans, Jan; Jonckheere, Rik; Goethals, Mieke; Ronse, Kurt (2007) -
Status of 157nm Lithography Development
Jonckheere, Rik; Hermans, Jan; Goethals, Mieke; De Bisschop, Peter; Eliat, Astrid; Van Den Heuvel, Dieter; Van Roey, Frieda; Beckx, Stephan; Wouters, Johan M. D.; de Marneffe, Jean-Francois; Ronse, Kurt (2003) -
The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay
Mouraille, Orion; van Haren, Richard; Steinert, Steffen; D'have, Koen; Van Dijk, Leon; Hermans, Jan; Beyer, Dirk (2019) -
The mask contribution as part of the intra-field on-product overlay performance
Mouraille, Orion; van Haren, Richard; Steinert, Steffen; Hermans, Jan; van Dijk, Leon; Beyer, Dirk; Yildirim, Oktay (2020)