Publication:
Ternary CoxFe(1-x)Si2 and NixFe(1-x)Si2 formed by ion implantation in silicon
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1942 since deposited on 2021-10-14
Acq. date: 2026-02-25
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Statistics
Views
1942 since deposited on 2021-10-14
Acq. date: 2026-02-25
Citations