Dependence of the minimal PVD Ta(N) sealing thickness on the porosity of Zirkon low-k films

Iacopi, Francesca; Zistl, C.; Jehoul, Christiane; Tokei, Zsolt; Le, Quoc Toan; Das, Arabinda; Sullivan, C.; Prokopowicz, G.; Gronbeck, D.; Gallagher, M.; Calvert, J.; Maex, Karen

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Dependence of the minimal PVD Ta(N) sealing thickness on the porosity of Zirkon low-k films

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2002

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Microelectronic Engineering

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Dependence of the minimal PVD Ta(N) sealing thickness on the porosity of Zirkon low-k films

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