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The influence of the interface trap densities on the extraction of the silicon film and front oxide thickness of SOI NMOS devices at low temperatures

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1939 since deposited on 2021-10-14
3last month
1last week
Acq. date: 2026-01-09

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1939 since deposited on 2021-10-14
3last month
1last week
Acq. date: 2026-01-09

Citations