Publication:
Growth mechanism and continuity of atomic layer deposited TiN films on thermal SiO2
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2000 since deposited on 2021-10-14
5last month
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Acq. date: 2026-01-11
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Views
2000 since deposited on 2021-10-14
5last month
2last week
Acq. date: 2026-01-11
Citations