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Comparative study of SiOCH low-k films with varied porosity interacting with etching and cleaning plasma
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Authors
Shamiryan, Denis
;
Baklanov, Mikhaïl
;
Vanhaelemeersch, Serge
;
Maex, Karen
Issue
5
Journal
Journal of Vacuum Science & Technology B
Volume
20
Title
Comparative study of SiOCH low-k films with varied porosity interacting with etching and cleaning plasma
Publication type
Journal article
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