Publication:
On the thermal stability of Atomic Layer Deposition (ALD) TiN as gate electrode in MOS devices
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1954 since deposited on 2021-10-15
5last month
2last week
Acq. date: 2026-01-10
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Views
1954 since deposited on 2021-10-15
5last month
2last week
Acq. date: 2026-01-10
Citations