Authors

Boher, P.; Defranoux, C.; Bourtault, S.; Piel, J.P.; Bender, Hugo

Conference

Analytical and Diagnostic Techniques for Semiconductor Materials, Devices and Processes

Title

Spectroscopic ellipsometry in the VUV range applied to the characterization of atomic layer deposited HfO2,Al2O3 and HfAlOx thin layers for high k dielectrics

Publication type

Proceedings paper

Embargo date

9999-12-31