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High-k materials for advanced gate stack dielectrics: a comparison of ALCVD and MOCVD as deposition technologies
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2071 since deposited on 2021-10-15
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Acq. date: 2025-12-11
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Views
2071 since deposited on 2021-10-15
1last month
1last week
Acq. date: 2025-12-11
Citations