Publication:

High-k materials for advanced gate stack dielectrics: a comparison of ALCVD and MOCVD as deposition technologies

Date

2003

Proceedings Paper

Simple item page Full metadata Statistics

Author(s)

;

;

;

Conard, Thierry

;

De Gendt, Stefan

;

Delabie, Annelies

;

;

;

Ragnarsson, Lars-Ake

;

Richard, Olivier

;

Vandervorst, Wilfried

;

Van Elshocht, Sven

;

;

;

;

;

;

;

Statistics

2078 since deposited on 2021-10-15

Acq. date: 2026-05-02