Authors

Caymax, Matty; Bender, Hugo; Brijs, Bert; Conard, Thierry; De Gendt, Stefan; Delabie, Annelies; Heyns, Marc; Onsia, Bart; Ragnarsson, Lars-Ake; Richard, Olivier; Vandervorst, Wilfried; Van Elshocht, Sven; Zhao, Chao; Maes, J.W.; Daté, L.; Pique, D.; Young, E.; Tsai, W.; Shimamoto, Y.

Conference

CMOS Front-End Materials and Process Technology

Title

High-k materials for advanced gate stack dielectrics: a comparison of ALCVD and MOCVD as deposition technologies

Publication type

Proceedings paper