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Process optimization and integration of trimethylsilane-deposited a-SiC:H and a-SiCO:H dielectric thin films for damascene processing
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1951 since deposited on 2021-10-15
2last month
Acq. date: 2025-12-09
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Metrics
Views
1951 since deposited on 2021-10-15
2last month
Acq. date: 2025-12-09
Citations