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Process optimization and integration of trimethylsilane-deposited a-SiC:H and a-SiCO:H dielectric thin films for damascene processing
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1952 since deposited on 2021-10-15
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Acq. date: 2026-01-11
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Views
1952 since deposited on 2021-10-15
1last month
1last week
Acq. date: 2026-01-11
Citations