Publication:

Charge trapping and dielectric reliability of SiO2/AI2O3 gate stacks with TiN electrodes

Date

2003

Journal article

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Author(s)

Kerber, Andreas

;

Cartier, Eduard

;

Degraeve, Robin

;

Roussel, Philippe

;

Pantisano, Luigi

;

Kauerauf, Thomas

;

Groeseneken, Guido

;

;

Journal

IEEE Trans. Electron Devices

Statistics

1918 since deposited on 2021-10-15

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Acq. date: 2026-05-19