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Comparison of sub 1 nm TiN/HfO2 with Poly-Si/HfO2 gate stacks u sing scaled chemical oxide interfaces

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2059 since deposited on 2021-10-15
3last month
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Acq. date: 2026-07-27

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2059 since deposited on 2021-10-15
3last month
1last week
Acq. date: 2026-07-27

Citations