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HfONx high-k layers deposited by MOCVD in mixed gas flows of N2O and O2

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1945 since deposited on 2021-10-15
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Acq. date: 2026-08-06

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1945 since deposited on 2021-10-15
4last month
3last week
Acq. date: 2026-08-06

Citations