Publication:

Comprehensive electromigration studies of dual-damascene Cu interconnects with ALD WCxNy barriers

Date

Loading...
Thumbnail Image

Abstract

Description

Statistics

Views

1955 since deposited on 2021-10-15
6last month
5last week
Acq. date: 2026-02-25

Citations

Statistics

Views

1955 since deposited on 2021-10-15
6last month
5last week
Acq. date: 2026-02-25

Citations