Publication:
Comprehensive electromigration studies of dual-damascene Cu interconnects with ALD WCxNy barriers
Date
Loading...
Journal
Abstract
Description
Metrics
Views
1947 since deposited on 2021-10-15
Acq. date: 2025-12-08
Citations
Metrics
Views
1947 since deposited on 2021-10-15
Acq. date: 2025-12-08
Citations