Toggle navigation
My submissions
Login
Toggle navigation
View item
imec Publications Repository
imec Publications
Articles
View item
imec Publications Repository
imec Publications
Articles
View item
JavaScript is disabled for your browser. Some features of this site may not work without it.
Characteristics of low-energy nitrogen ion-implanted oxide and NO-annealed gate dielectrics
View/
open
9162.pdf (170.2Kb)
Metadata
Show full item record
Authors
Lee, Shih Chung
;
Simoen, Eddy
;
Badenes, Gonçal
Issue
9
Journal
Solid-State Electronics
Volume
48
Title
Characteristics of low-energy nitrogen ion-implanted oxide and NO-annealed gate dielectrics
Publication type
Journal article
Embargo date
9999-12-31
Collections
Articles
Search imec Publications Repository
This collection
Browse
All of imec Publications Repository
Collections
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
This collection
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
My account
login