N-2 as carrier gas: an alternative to H-2 for enhanced epitaxy of Si, SiGe and SiGe:C

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Authors

Meunier-Beillard, Philippe; Caymax, Matty; Van Nieuwenhuysen, Kris; Doumen, Geert; Brijs, Bert; Hopstaken, M.; Geenen, Luc; Vandervorst, Wilfried

Issue

1_4

Journal

Applied Surface Science

Volume

224

Title

N-2 as carrier gas: an alternative to H-2 for enhanced epitaxy of Si, SiGe and SiGe:C

Publication type

Journal article

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