Publication:
Channel engineering and junction overlap issues for ultra-shallow junctions formed by SPER in the 45 nm CMOS technology node
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1917 since deposited on 2021-10-15
3last month
2last week
Acq. date: 2026-02-25
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Statistics
Views
1917 since deposited on 2021-10-15
3last month
2last week
Acq. date: 2026-02-25
Citations