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X-ray photoelectron spectroscopy characterisation of high-k dielectric Al2O3 and HfO2 layers deposited on SiO2/Si surface
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Authors
Vitchev, R.G.
;
Pireaux, J.J.
;
Conard, Thierry
;
Bender, Hugo
;
Wolstenholme, J.
;
Defranoux, C.
Issue
1_2
Journal
Applied Surface Science
Volume
235
Title
X-ray photoelectron spectroscopy characterisation of high-k dielectric Al2O3 and HfO2 layers deposited on SiO2/Si surface
Publication type
Journal article
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