Browsing by Author "Abe, Tsukasa"
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Publication Alternative EUV multilayer mirror mask for reduced mask 3D effects evaluated at NA0.33
Proceedings paper2025, Photomask Technology, 2025-09-22, p.1368711Publication Bright-field EUV mask patterning for extending scaling roadmap
Proceedings paper2025, Photomask Technology, 2025-09-22, p.136870RPublication Comparison between existing inspection techniques for EUV mask defects
Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 17/10/2010Publication Natural EUV mask blank defects: evidence, timely detection, analysis and outlook
Proceedings paper2010, Photomask Technology 2010, 13/09/2010, p.78231T