Browsing by Author "Afanasiev, Valeri"
- Results Per Page
- Sort Options
Publication 6Å EOT Si0.45Ge0.55 pMOSFET with optimized reliability (VDD=1V): Meeting the NBTI lifetime target at ultra-thin EOT
Proceedings paper2010, IEEE International Electron Devices Meeting - IEDM, 6/12/2010, p.70-73Publication A sensitivity map-based approach to profile defects in MIM capacitors from I-V, C-V and G-V measurements
Journal article2019, IEEE Transactions on Electron Devices, (66) 4, p.1892-1998Publication A Theoretical Analysis of Ferroelectric Switching Physics in Metal/Ferroelectric/IGZO Stack Toward Interlayer-Free FeFETs
; ; ; ; ; Journal article2024, IEEE ELECTRON DEVICE LETTERS, (45) 8, p.1453-1456Publication Advanced ultralow-k organosilicate glasses: NEXAFS study
Meeting abstract2015, 16th International Conference on X-ray Absorption Fine Structure - XAFS 16, 23/08/2015, p.VI-0-05Publication Advances in SiCN-SiCN bonding with high accuracy wafer-to-wafer (W2W) stacking technology
Proceedings paper2018, IEEE International Interconnect Technology Conference - IITC, 4/06/2018, p.985-992Publication An electric field tunable energy band gap at silicene/(0001) ZnS interfaces
Journal article2013, Physical Chemistry Chemical Physics, (15) 11, p.3702-3705Publication Application of soft X-ray reflectometry for analysis of underlayer influence on structure of atomic-layer deposited SrTixOy films
;Filatova, E.O. ;Kozhevnikov, I.V. ;Sokolov, A.A. ;Konashuk, A.S.Schaefers, F.Journal article2014, Journal of Electron Spectroscopy and Related Phenomena, 196, p.110-116Publication Atomic and electrical characterisation of amorphous silicon passivation layers
Proceedings paper2012, Proceedings of the 2nd International Conference on Crystalline Silicon Photovoltaics - Silicon PV, 3/04/2012, p.185-190Publication Atomic layer deposited Gd-doped HfO2 thin films: from high-k dielectrics to ferroelectrics
Meeting abstract2012, Frontiers in Electronic Materials: Correlation Effects and Memristive Phenomena, 17/06/2012, p.411-412Publication Atomic layer deposition of GdAlOx and GdHfOx using Gd(iPr-Cp)3
Meeting abstract2009, 216th ECS Meeting, 4/10/2009, p.2035Publication Atomistic investigation of the electronic structure, thermal properties and conduction defects in Ge-rich GexSe1-x materials for selector applications
Proceedings paper2017, IEEE International Electron Devices Meeting - IEDM, 2/12/2017, p.79-82Publication Band alignment and electron traps in Y2O3 layers on (100) Si
Journal article2009, Applied Physics Letters, (95) 13, p.132903Publication Band alignment at the interface of (100)Si with HfxTa1-xOy high-k dielectric layers
Journal article2005, Applied Physics Letters, (86) 7, p.072108-1-072108-3Publication Band alignment between (100)Si and complex rare earth/transition metal oxides
Journal article2004, Applied Physics Letters, (85) 24, p.5917-5919Publication Band alignment between (100)Si and complex rare-earth/transition metal oxides
; ; ;Zhao, Chao; ;Heeg, ;Schubert, ;Jia, Y.Schlom, D.Oral presentation2004, 35th IEEE Semiconductor Interface Specialists ConferencePublication Band alignment between (100)Si and Hf-based complex metal oxides
Journal article2005, Microelectronic Engineering, (80) 80, p.102-105Publication Band offsets at interfaces of (100)InxGa1-xAs (0
Journal article2009, Microelectronic Engineering, (86) 7_9, p.1550-1553Publication Band offsets at the (100)GaSb/Al2O3 interface from internal electron photoemission study
Journal article2011, Microelectronic Engineering, (88) 7, p.1050-1053Publication Bandgap narrowing in low-k dielectrics
;Guo, X ;King, S ;Xue, P; ;Baklanov, Mikhaïl; Nishi, Y.Meeting abstract2015, AVS 62nd International Symposium & Exhibition, 18/10/2015Publication Can silicon behave like graphene? A first-principles study
Journal article2010, Applied Physics Letters, (97) 11, p.112106