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Browsing by Author "Afanasiev, Valeri"

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    6Å EOT Si0.45Ge0.55 pMOSFET with optimized reliability (VDD=1V): Meeting the NBTI lifetime target at ultra-thin EOT

    Franco, Jacopo  
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    Kaczer, Ben  
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    Eneman, Geert  
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    Mitard, Jerome  
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    Stesmans, Andre  
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    Afanasiev, Valeri  
    Proceedings paper
    2010, IEEE International Electron Devices Meeting - IEDM, 6/12/2010, p.70-73
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    A sensitivity map-based approach to profile defects in MIM capacitors from I-V, C-V and G-V measurements

    Padovani, Andrea
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    Kaczer, Ben  
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    Pesic, Milan
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    Belmonte, Attilio  
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    Popovici, Mihaela Ioana  
    Journal article
    2019, IEEE Transactions on Electron Devices, (66) 4, p.1892-1998
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    A Theoretical Analysis of Ferroelectric Switching Physics in Metal/Ferroelectric/IGZO Stack Toward Interlayer-Free FeFETs

    Chen, Zhuo  
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    Ronchi, Nicolo  
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    Tang, Hongwei  
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    Walke, Amey  
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    Izmailov, Roman  
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    Popovici, Mihaela Ioana  
    Journal article
    2024, IEEE ELECTRON DEVICE LETTERS, (45) 8, p.1453-1456
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    Advanced ultralow-k organosilicate glasses: NEXAFS study

    Konashuk, A.
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    Filatova, E.
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    Afanasiev, Valeri  
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    Krishtab, Mikhail  
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    Redzheb, Murad
    Meeting abstract
    2015, 16th International Conference on X-ray Absorption Fine Structure - XAFS 16, 23/08/2015, p.VI-0-05
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    Advances in SiCN-SiCN bonding with high accuracy wafer-to-wafer (W2W) stacking technology

    Peng, Lan  
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    Kim, Soon-Wook  
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    Iacovo, Serena  
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    Inoue, Fumihiro  
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    Phommahaxay, Alain  
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    Sleeckx, Erik  
    Proceedings paper
    2018, IEEE International Interconnect Technology Conference - IITC, 4/06/2018, p.985-992
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    An electric field tunable energy band gap at silicene/(0001) ZnS interfaces

    Houssa, Michel  
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    van den Broek, Bas
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    Scalise, Emilio
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    Pourtois, Geoffrey  
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    Afanasiev, Valeri  
    Journal article
    2013, Physical Chemistry Chemical Physics, (15) 11, p.3702-3705
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    Application of soft X-ray reflectometry for analysis of underlayer influence on structure of atomic-layer deposited SrTixOy films

    Filatova, E.O.
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    Kozhevnikov, I.V.
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    Sokolov, A.A.
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    Konashuk, A.S.
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    Schaefers, F.
    Journal article
    2014, Journal of Electron Spectroscopy and Related Phenomena, 196, p.110-116
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    Atomic and electrical characterisation of amorphous silicon passivation layers

    O'Sullivan, Barry  
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    Thoan, N.H.
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    Jivanescu, M.
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    Pantisano, Luigi
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    Bearda, Twan
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    Dross, Frederic
    Proceedings paper
    2012, Proceedings of the 2nd International Conference on Crystalline Silicon Photovoltaics - Silicon PV, 3/04/2012, p.185-190
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    Atomic layer deposited Gd-doped HfO2 thin films: from high-k dielectrics to ferroelectrics

    Adelmann, Christoph  
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    Ragnarsson, Lars-Ake  
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    Moussa, Alain  
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    Woicik, Joseph
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    Mueller, Stefan
    Meeting abstract
    2012, Frontiers in Electronic Materials: Correlation Effects and Memristive Phenomena, 17/06/2012, p.411-412
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    Atomic layer deposition of GdAlOx and GdHfOx using Gd(iPr-Cp)3

    Adelmann, Christoph  
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    Pierreux, Dieter  
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    Swerts, Johan  
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    Kesters, Jurgen
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    Richard, Olivier  
    Meeting abstract
    2009, 216th ECS Meeting, 4/10/2009, p.2035
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    Atomistic investigation of the electronic structure, thermal properties and conduction defects in Ge-rich GexSe1-x materials for selector applications

    Clima, Sergiu  
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    Govoreanu, Bogdan  
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    Opsomer, Karl  
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    Velea, Alin
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    Avasarala, Naga Sruti
    Proceedings paper
    2017, IEEE International Electron Devices Meeting - IEDM, 2/12/2017, p.79-82
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    Band alignment and electron traps in Y2O3 layers on (100) Si

    Wang, Wan Chih
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    Badylevitch, M.
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    Afanasiev, Valeri  
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    Stesmans, Andre  
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    Adelmann, Christoph  
    Journal article
    2009, Applied Physics Letters, (95) 13, p.132903
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    Band alignment at the interface of (100)Si with HfxTa1-xOy high-k dielectric layers

    Afanasiev, Valeri  
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    Stesmans, Andre  
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    Zhao, Chao
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    Caymax, Matty  
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    Rittersma, Z.M.
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    Maes, Jan  
    Journal article
    2005, Applied Physics Letters, (86) 7, p.072108-1-072108-3
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    Band alignment between (100)Si and complex rare earth/transition metal oxides

    Afanasiev, Valeri  
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    Stesmans, Andre  
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    Zhao, Chao
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    Caymax, Matty  
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    Heeg, T.
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    Schubert, J.
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    Jia, Y.
    Journal article
    2004, Applied Physics Letters, (85) 24, p.5917-5919
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    Band alignment between (100)Si and complex rare-earth/transition metal oxides

    Afanasiev, Valeri  
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    Stesmans, Andre  
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    Zhao, Chao
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    Caymax, Matty  
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    Heeg,
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    Schubert,
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    Jia, Y.
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    Schlom, D.
    Oral presentation
    2004, 35th IEEE Semiconductor Interface Specialists Conference
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    Band alignment between (100)Si and Hf-based complex metal oxides

    Afanasiev, Valeri  
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    Stesmans, Andre  
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    Zhao, Chao
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    Caymax, Matty  
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    Rittersma, Z.M.
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    Maes, Jan  
    Journal article
    2005, Microelectronic Engineering, (80) 80, p.102-105
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    Band offsets at interfaces of (100)InxGa1-xAs (0

    Afanasiev, Valeri  
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    Stesmans, Andre  
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    Brammertz, Guy  
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    Delabie, Annelies  
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    Sioncke, Sonja
    Journal article
    2009, Microelectronic Engineering, (86) 7_9, p.1550-1553
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    Band offsets at the (100)GaSb/Al2O3 interface from internal electron photoemission study

    Afanasiev, Valeri  
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    Chou, H. C.
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    Stesmans, Andre  
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    Merckling, Clement  
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    Sun, Xiao  
    Journal article
    2011, Microelectronic Engineering, (88) 7, p.1050-1053
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    Bandgap narrowing in low-k dielectrics

    Guo, X
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    King, S
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    Xue, P
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    de Marneffe, Jean-Francois  
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    Baklanov, Mikhaïl
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    Afanasiev, Valeri  
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    Nishi, Y.
    Meeting abstract
    2015, AVS 62nd International Symposium & Exhibition, 18/10/2015
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    Can silicon behave like graphene? A first-principles study

    Houssa, Michel  
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    Pourtois, Geoffrey  
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    Afanasiev, Valeri  
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    Stesmans, Andre  
    Journal article
    2010, Applied Physics Letters, (97) 11, p.112106
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