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Browsing by Author "Ameen, Mike"

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    Cost effective low Vt Ni-FUSI CMOS on SiON by means of Al implant (pMOS) and Yb+P implant (nMOS)

    Lauwers, Anne  
    ;
    Veloso, Anabela  
    ;
    Chang, Shou-Zen
    ;
    Yu, HongYu
    ;
    Hoffmann, Thomas Y.
    Journal article
    2008, IEEE Electron Device Letters, (29) 1, p.34-37
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    Implementation of molecular ion implant technology for PMOS extension

    Falepin, Annelies  
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    Collart, Erik
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    Tran, Sandra
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    Harris, Mark
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    Ameen, Mike
    ;
    Hoffmann, Thomas Y.
    Proceedings paper
    2008, 8th International Workshop on Junction Technology - IWJT, 15/05/2008, p.46-48
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    Influence of the process sequence and termal budget on the strain of SiC stressor layers formed by ion implantation

    Rosseel, Erik  
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    Ortolland, Claude
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    Hikavyy, Andriy  
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    Schram, Tom  
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    Falepin, Annelies  
    Proceedings paper
    2010, 18th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP, 29/09/2010, p.32-40
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    Influence of the process sequence and termal budget on the straion fof SiC stressor layers formed by Ion Implantation

    Rosseel, Erik  
    ;
    Ortolland, Claude
    ;
    Hikavyy, Andriy  
    ;
    Schram, Tom  
    ;
    Falepin, Annelies  
    Meeting abstract
    2010-10, 18th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP, 29/09/2010

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