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Browsing by Author "Andreas, Michael"

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    Acoustic cleaning in nano-electronics

    Mertens, Paul  
    ;
    Janssens, Tom
    ;
    Holsteyns, Frank  
    ;
    Zijlstra, Aaldert
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    Halder, Sandip  
    ;
    Wostyn, Kurt  
    Proceedings paper
    2008, Acoustics, 29/06/2008, p.556-560
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    Damage cluster analysis of patterned wafers during solvent spray cleaning

    Halder, Sandip  
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    Wostyn, Kurt  
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    Andreas, Michael
    ;
    Wada, Masayuki
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    Brems, Steven  
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    Bearda, Twan
    Meeting abstract
    2009, 216th ECS Meeting, 4/10/2009, p.2081
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    Damage cluster analysis of patterned wafers during solvent spray cleaning

    Halder, Sandip  
    ;
    Wostyn, Kurt  
    ;
    Andreas, Michael
    ;
    Wada, Masayuki
    ;
    Brems, Steven  
    ;
    Bearda, Twan
    Proceedings paper
    2009, Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11, 4/10/2009, p.219-225
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    High velocity aerosol cleaning with organic solvents: particle removal and substrate damage

    Andreas, Michael
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    Wostyn, Kurt  
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    Wada, Masayuki
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    Janssens, Tom
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    Kenis, Karine  
    ;
    Bearda, Twan
    Journal article
    2009, Solid State Phenomena, 145-146, p.39-42
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    High velocity aerosol cleaning with organic solvents: particle removal and substrate damage

    Andreas, Michael
    ;
    Wostyn, Kurt  
    ;
    Wada, Masayuki
    ;
    Janssens, Tom
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    Kenis, Karine  
    ;
    Bearda, Twan
    Oral presentation
    2008, 9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces - UCPSS
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    Particle removal efficiency and damage analysis on silicon wafers after megasonic cleaning in solvents

    Barbagini, Francesca
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    Halder, Sandip  
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    Janssens, Tom
    ;
    Kenis, Karine  
    ;
    Wostyn, Kurt  
    ;
    Bearda, Twan
    Journal article
    2009, Journal of Adhesion Science and Technology, (23) 12, p.1709-1721
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    Roadblocks and critical aspects for sub 45 nm wafer cleaning and possible solutions

    Mertens, Paul  
    ;
    Vos, Rita  
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    Vereecke, Guy  
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    Janssens, Tom
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    Wostyn, Kurt  
    ;
    Claes, Martine  
    ;
    Kesters, Els  
    Proceedings paper
    2008, 7th International Semiconductor Technology Conference - ISTC, 15/03/2008, p.436-446
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    Spray systems for cleaning during semiconductor manufacturing

    Wostyn, Kurt  
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    Wada, Masayuki
    ;
    Sano, Ken-Ichi
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    Andreas, Michael
    ;
    Janssens, Tom
    ;
    Bearda, Twan
    Oral presentation
    2008, 22nd European Conference on Liquid Atomization and Spray Systems
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    Tackling the challenges of physical cleaning

    Wostyn, Kurt  
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    Janssens, Tom
    ;
    Zijlstra, Aaldert
    ;
    Wada, Masayuki
    ;
    Andreas, Michael
    ;
    Kim, Tae-Gon
    Oral presentation
    2008, 8th International Surface Cleaning Users Group Meeting Cleaning Technology Symposium

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