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Browsing by Author "Atanasova, Tanya"

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    Adsorption/desorption of suppressor complex on copper: description of the critical potential

    Atanasova, Tanya
    ;
    Strubbe, Katrien
    ;
    Vereecken, Philippe  
    Proceedings paper
    2011-01, Molecular Structure of the Solid-Liquid Interface and Its Relationship to Electrodeposition 7, 9/10/2010, p.13-26
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    Adsorption/desorption of suppressor complex on copper: description of the critical potential

    Atanasova, Tanya
    ;
    Strubbe, Katrien
    ;
    Vereecken, Philippe  
    Meeting abstract
    2010, 218th ECS Meeting Symposium 'Molecular Structure of the Solid-Liquid Interface and its Relationship to Electrodeposition 7', 10/10/2010, p.2039
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    Characterization of threading dislocations in thin germanium layers by defect etching: towards chromium and HF free solution

    Souriau, Laurent  
    ;
    Atanasova, Tanya
    ;
    Terzieva, Valentina  
    ;
    Moussa, Alain  
    ;
    Caymax, Matty  
    Journal article
    2008, Journal of the Electrochemical Society, (155) 9, p.H673-H681
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    Effect of ionic strength and the electrolyte composition on the suppression of copper deposition by PEG

    Atanasova, Tanya
    ;
    Strubbe, Katrien
    ;
    Vereecken, Philippe  
    Proceedings paper
    2010, Fundamentals of Electrochemical Growth: From UPD to Microstructures - Symposium in Memory of Prof. Evgeni Budevski, 4/10/2009, p.67-78
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    Electrochemical determination of the cupric ion activity in aqueous acidic cupric sulfate electrolytes

    Atanasova, Tanya
    ;
    Strubbe, Katrien
    ;
    Vereecken, Philippe  
    Journal article
    2013, Journal of the Electrochemical Society, (160) 2, p.D60-D65
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    Physicochemical mechanism of damascene copper plating: effect of suppressor

    Atanasova, Tanya
    ;
    Strubbe, Katrien
    ;
    Vereecken, Philippe  
    Meeting abstract
    2009, 216th ECS Meeting, 4/10/2009, p.2708
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    Seed-less copper electrochemical deposition on PVD resistive substrates as a replacement/enhancement for PVD Cu seed layers in HAR TSVs

    Armini, Silvia  
    ;
    Wilson, Chris  
    ;
    Moussa, Alain  
    ;
    Franquet, Alexis  
    ;
    Vanstreels, Kris  
    Proceedings paper
    2010, Electrochemical Engineering for the 21st Century (dedicated to Richard C. Alkire), 24/04/2010, p.77-87
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    Ultra-low copper baths for sub-30nm copper interconnects

    Atanasova, Tanya
    ;
    Caluwaerts, Rudy  
    ;
    Carbonell, Laure
    ;
    Strubbe, Katrien
    ;
    Vereecken, Philippe  
    Meeting abstract
    2011, 220th ECS Fall Meeting Symposium F4: Semiconductors, Metal Oxides and Composites, 9/10/2011, p.2330
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    Ultra-low copper baths for sub-35 nm copper interconnects

    Atanasova, Tanya
    ;
    Carbonell, Laure
    ;
    Caluwaerts, Rudy  
    ;
    Tokei, Zsolt  
    ;
    Strubbe, Katrien
    Journal article
    2013, Journal of the Electrochemical Society, (160) 12, p.D3222-D3259
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    Ultra-low copper baths for sub-35nm copper interconnects

    Atanasova, Tanya
    Oral presentation
    2011, IMEC PhD Conference Fun in Research
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    Ultra-low copper baths for sub-35nm copper interconnects

    Atanasova, Tanya
    ;
    Carbonell, Laure
    ;
    Caluwaerts, Rudy  
    ;
    Tokei, Zsolt  
    ;
    Strubbe, Katrien
    Proceedings paper
    2012, Processing Materials of 3D Interconnects, Damascene and Electronics Packaging, 9/10/2011, p.83-97
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    Wafer-scale Cu plating uniformity on thin Cu seed layers

    Yang, Liu
    ;
    Atanasova, Tanya
    ;
    Radisic, Alex  
    ;
    Deconinck, Johan
    ;
    West, Alan
    ;
    Vereecken, Philippe  
    Journal article
    2013, Electrochimica Acta, 104, p.242-248

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