Browsing by Author "Baik, Ki-Ho"
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Publication Attenuated phase shifting masks in combination with off-axis illumination: A way towards quarter micron DUV lithography for random logic operations
Journal article1994, Microelectronic Engineering, 23, p.133-138Publication Extending the Limits of Optical Lithography for Arbitrary Mask Layouts Using Attenuated Phase Shifting Masks with Optimized Illumination
Journal article1994, J. Vac. Sci. Technol. B, (12) 6, p.3783-3792Publication Lithographic evaluation of a new wet silylation process using safe solvents and the commercial photoresist AZ 5214E
Journal article1994, Microelectron. Eng., 23, p.267-270Publication Optimization of the optical phase shift in attenuated PSM and application to quarter micron deep-UV lithography for logics
Proceedings paper1994, Optical/Laser Microlithography VII, 02/03/1994, p.86-98Publication Proximity effects in dry developed lithography for sub-0.35 µm application
Proceedings paper1994, Advances in Resist Technology and Processing XI, 28/02/1994, p.394-406