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Browsing by Author "Bertrand, P."

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    Advanced characterisation : an indispensable tool for ultra clean processing

    Vandervorst, Wilfried  
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    Bender, Hugo  
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    Storm, Wolfgang
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    Heyns, Marc  
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    Polleunis, C.
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    Bertrand, P.
    Journal article
    1995, Microelectronic Engineering, (28) 1_4, p.27-34
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    Combining TOF-SIMS with XPS to quantify organic surface coverages

    Kenens, Conny
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    Conard, Thierry  
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    Hellemans, L.
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    Bertrand, P.
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    Vandervorst, Wilfried  
    Proceedings paper
    2000, Secondary Ion Mass Spectrometry - SIMS XII. Proceedings of the 12th International Conference, 5/09/1999, p.821-824
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    Degradation of clean Si-surfaces due to storage in clean (?) wafer boxes

    Storm, Wolfgang
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    Vandervorst, Wilfried  
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    Alay, Josep Lluis
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    Meuris, Marc  
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    Opdebeeck, Ann  
    Proceedings paper
    1994, Proceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 19/09/1994, p.367-370
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    Influence of electromagnetic interferences on the mass sensitivity of surface acoustic wave sensors

    Francis, Laurent
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    Friedt, Jean-Michel
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    De Palma, Randy
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    Bertrand, P.
    ;
    Campitelli, Andrew
    Proceedings paper
    2004, Technical Digest of Eurosensors XVIII, 12/09/2004, p.714-715
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    Just-Clean- Enough technology for the 21st century

    Heyns, Marc  
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    Meuris, Marc  
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    Mertens, Paul  
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    Hurd, Trace
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    Schmidt, Harald
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    Depas, Michel
    Oral presentation
    1995, SEMICON Europe
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    ToF-SIMS and XPS characterization of plasma etch residues on cobalt silicide surfaces

    Storm, Wolfgang
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    Vandervorst, Wilfried  
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    Vanhaelemeersch, Serge  
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    Baklanov, Mikhaïl
    ;
    Maex, Karen  
    Proceedings paper
    1997, Secondary Ion Mass Spectrometry - SIMS X : Proceedings of the 10th International Conference, 2/10/1995, p.921-924

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