Browsing by Author "Beyer, Dirk"
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Publication Co-optimizatin of RegC and TWINSCANTM corrections to improve the intra-field on-product overlay performance
Proceedings paper2016, Metrology, Inspection, and Process Control for Microlithography XXX, 21/02/2016, p.97783DPublication Direct correlation between mask registration and on-wafer measurements for individual logic device features
Proceedings paper2022, Photomask Technology Conference, SEP 26-29, 2022, p.Art. 122930LPublication Intra-field mask-to-mask overlay, separating the mask writing from the dynamic pellicle contribution
Proceedings paper2018, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology, 18/04/2018, p.108070KPublication Off-line mask-to-mask registration characterization
Meeting abstract2017, Photomask Photomask Technology and EUV Lithography, 11/09/2017, p.1045111-1-1045111-16Publication The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay
; ; Publication The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay
; ; Publication The mask contribution as part of the intra-field on-product overlay performance
; ; Publication The mask contribution as part of the intra-field on-product overlay performance
Proceedings paper2020, Photomask Technology Conference, SEP 21-25, 2020Publication Wafer alignment mark placement accuracy impact on the layer to layer overlay performance
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