Browsing by Author "Boissiere, Olivier"
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Publication AVD and MOCVD TaCN-based films for gate metal applications on high-k gate dielectrics
Publication Growth of dysprosium-, scandium-, and hafnium-based third generation high-k dielectrics by atomic-vapor deposition
Journal article2007-10, Chemical Vapor Deposition, 13, p.567-573Publication Thermally-stable high effective work function TaCN and Ta2N films for pMOS metal gate applications
Proceedings paper2008, Materials Science of High-k Dielectric Stacks - From Fundamentals to Technology, 24/03/2008, p.1073-H01-08