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Browsing by Author "Brongersma, H.H."

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    A study of growth mechanism of TiN and WCN barrier films deposited by atomic layer deposition on different substrates

    Satta, Alessandra
    ;
    Schuhmacher, Jörg
    ;
    Whelan, Caroline
    ;
    Vandervorst, Wilfried  
    Meeting abstract
    2002, B-ALD-5: The 5th Baltic Symposium on Atomic Layer Deposition, 24/10/2002, p.21
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    Growth mechanism and continuity of atomic layer deposited TiN films on thermal SiO2

    Satta, Alessandra
    ;
    Schuhmacher, Jörg
    ;
    Whelan, Caroline
    ;
    Vandervorst, Wilfried  
    Journal article
    2002, Journal of Applied Physics, (92) 12, p.7641-7646
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    Nucleation and growth of TiN films deposited by atomic layer deposition

    Satta, Alessandra
    ;
    Brongersma, Sywert  
    ;
    Schuhmacher, Jörg
    ;
    Conard, Thierry  
    ;
    Beyer, Gerald  
    Proceedings paper
    2002, Proceedings of the 3rd AVS International Conference on Microelectronics and Interfaces, 11/02/2002, p.52-54

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