Browsing by Author "Burbine, Andrew"
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Publication Calibration and application of a DSA Compact model for grapho-epitaxy hole processes using contour-based metrology
;Fenger, Germain ;Burbine, Andrew ;Torres, J. Andres ;Ma, YuanshengGranik, YuriProceedings paper2014, Photomask Technology, 16/09/2014, p.92351XPublication Effective use of aerial image metrology for calibration of OPC models
;Chen, Ao ;Foong, Yee Mei ;Thaler, Thomas ;Buttgereit, Ute ;Chung, AngelineBurbine, AndrewProceedings paper2017, Optical Microlithography XXX, 26/02/2017, p.101470YPublication Optimizing EUV OPC Runtime and Pattern Fidelity in DRAM Manufacturing Using Memory OPC Flow
Proceedings paper2025, 2025 Conference on Novel Patterning Technologies, 2025-04-25, p.134270Y-1-134270Y-6