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Browsing by Author "Burbine, Andrew"

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    Calibration and application of a DSA Compact model for grapho-epitaxy hole processes using contour-based metrology

    Fenger, Germain
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    Burbine, Andrew
    ;
    Torres, J. Andres
    ;
    Ma, Yuansheng
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    Granik, Yuri
    Proceedings paper
    2014, Photomask Technology, 16/09/2014, p.92351X
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    Effective use of aerial image metrology for calibration of OPC models

    Chen, Ao
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    Foong, Yee Mei
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    Thaler, Thomas
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    Buttgereit, Ute
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    Chung, Angeline
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    Burbine, Andrew
    Proceedings paper
    2017, Optical Microlithography XXX, 26/02/2017, p.101470Y
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    Optimizing EUV OPC Runtime and Pattern Fidelity in DRAM Manufacturing Using Memory OPC Flow

    De Gong, Shu
    ;
    Chen, Sheng Tse
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    Liao, Chun Cheng
    ;
    Huang, Teng Yen
    ;
    Meng, Renyang  
    ;
    Yang, Kiho  
    Proceedings paper
    2025, 2025 Conference on Novel Patterning Technologies, 2025-04-25, p.134270Y-1-134270Y-6

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