Browsing by Author "Chen, P.J."
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Publication Comparison of sub 1 nm TiN/HfO2 with Poly-Si/HfO2 gate stacks u sing scaled chemical oxide interfaces
Proceedings paper2003, Symposium on VLSI Technology. Digest of Technical Papers, 10/06/2003, p.21-22Publication Effect of Al-content and post deposition annealing on the electrical properties of ultra-thin HfAlxOy layers
; ; Zhao, ChaoProceedings paper2003, Novel Materials and Processes for Advanced CMOS, 2/12/2002, p.35-40Publication Investigation of poly-Si/HfO2 gate stacks in a self-aligned 65 nm NMOS process flow
Oral presentation2002, 33rd IEEE Semiconductor Interface Specialists Conference - SISCPublication Mobility in high-k dielectric based field effect transistors
Proceedings paper2003, Extended Abstracts of the 2003 International Conference on Solid State Device and Materials, 16/09/2003, p.46-47Publication Thermal stability of high k layers
Proceedings paper2003, Novel Materials and Processes for Advanced CMOS, 2/12/2002, p.9-14