Browsing by Author "Chua, T.C."

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Further optimization of plasma nitridation of ultra-thin oxides for 65-nm node MOSFETS

Kraus, P.A.
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Chua, T.C.
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Ahmed, K.Z.
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Campbell, J.
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Nouri, F.
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Cruise, J.
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Rothschild, Aude
Journal article
2004, Semiconductor Fabtech, 23, p.73-76
High performance & CMOS integration friendly dual metal gate MOSFETs using TaN/Ru or TaN/W/Ru stacking multi-layers on HfLaO gate dielectric

Wang, X.P.
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Li, M.F.
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Yu, HongYu
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Yang, J.J.
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Loh, W.Y.
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Zhu, C.X.
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Du, A.Y.
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Trigg, A.D.
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Zhang, G.
Proceedings paper
2007, International Conference on Solid State Devices and Materials - SSDM, 18/09/2006
Study of pulsed RF DPN process parameters for 65 nm node MOSFET gate dielectrics

Rothschild, Aude
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Kraus, P.A.
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Chua, T.C.
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Nouri, F.
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Cubaynes, Florence
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Veloso, Anabela
Proceedings paper
2004, Integration of Advanced Micro- and Nanoelectronic Devices - Critical Issues and Solutions, 10/04/2004, p.49-53