Browsing by Author "Constantoudis, V."
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Publication Effects of different processing conditions on line edge roughness for 193-nm and 157-nm resists
Proceedings paper2004, Metrology, Inspection, and Process Control for Microlithography XVIII, 22/02/2004, p.266-275Publication Line edge roughness and critical dimension variation: Fractal characterization and comparison using model functions
Publication Quantification of line-edge roughness of photoresists. I: A comparison between off-line and on-line analysis of top-down scanning electron microscopy images
Journal article2003, Journal of Vacuum Science & Technology B, (21) 3, p.1008-1018Publication Roughness analysis of lithographically produced nanostructures: off-line measurement and scaling analysis
Journal article2003, Microelectronic Engineering, 67-68, p.319-325