Browsing by Author "Cremel, Maxime"
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Publication Fabrication of porogen residue free ultra low-k PECVD material by subsequent H2-afterglow plasma treatment and UV curing
Proceedings paper2010, Advanced Metallization Confererce 2009 - AMC 2009, 13/10/2009, p.65-71Publication Mechanism of k-value reduction of PECVD Low-k films treated with He/H2 ash plasma
Meeting abstract2010, 3rd International Plasma Etch and Strip in Microelectronics Workshop - PESM, 4/03/2010Publication Porogen residue free ultra low-k PECVD material: fabrication, optical and mechanical properties
Meeting abstract2009, Advanced Metalization Conference, 13/10/2009