Browsing by Author "Dao, T."
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Publication Influence of the anneal conditions on arsenic activation during solid-phase epitaxial regrowth
Journal article2005, Applied Physics Letters, (87) 3, p.031915-1-031915-3Publication Island growth in the atomic layer deposition of zirconium oxide and aluminium oxide on hydrogen-terminated silicon: growth mode modelling and transmission electron microscopy
Journal article2004, Journal of Applied Physics, (96) 9, p.4878-4889Publication Self-aligned PtSi fully silicided (FUSI) metal gates for 45 nm CMOS applications
Proceedings paper2005-05, Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment, 16/05/2005, p.233-240Publication Tantalum-based gate electrode metals for advanced CMOS devices
Proceedings paper2005, Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment, 15/05/2005, p.215-224