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Browsing by Author "Davies, G."

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    193 nm lithography on a full field scanner

    Goethals, Mieke
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    Pollers, Ingrid
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    Jaenen, Patrick  
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    Van Roey, Frieda  
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    Ronse, Kurt  
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    Heskamp, B.
    Proceedings paper
    1999, Optical Microlithography XII, 14/03/1999, p.278-289
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    Advanced 193 nm step and scan technology

    Stoeldraijer, J.
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    Mulkens, J.
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    Davies, G.
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    Sytsma, J.
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    Bakker, H.
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    Glatzel, H.
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    Wagner, C.
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    Roempp, O.
    Meeting abstract
    1998, 4th International Symposium on 193 nm Lithography. Abstracts Book. "193nm '98. At the Peak", 14/09/1998
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    ArF step-and-scan exposure system for 0.15-μm and 0.13-μm technology nodes

    Mulkens, J.
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    Stoeldraijer, J.
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    Davies, G.
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    Dierichs, M.
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    Heskamp, B.
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    Moers, M. H.
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    George, R. A.
    Proceedings paper
    1999, Optical Microlithography XII, 14/03/1999, p.506-521
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    Introducing 193 nm lithography

    Pollers, Ingrid
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    Jaenen, Patrick  
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    Van Roey, Frieda  
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    Goethals, Mieke
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    Ronse, Kurt  
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    Davies, G.
    Proceedings paper
    1998, Proceedings of the Microlithography Symposium. Interface '98, 15/11/1998, p.179-198
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    Lithographic performance of 193 nm resist

    Goethals, Mieke
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    Pollers, Ingrid
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    Van Roey, Frieda  
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    Sugihara, Takashi
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    Ronse, Kurt  
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    Heskamp, B.
    Proceedings paper
    1998, 193nm '98. At the Peak. 4th International Symposium on 193 nm Lithography. Abstracts Book, 14/09/1998, p.P-020
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    Recent advancements in 193 nm step and scan lithography

    Goethals, Mieke
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    Jaenen, Patrick  
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    Pollers, Ingrid
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    Van Roey, Frieda  
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    Ronse, Kurt  
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    Heskamp, B.
    Journal article
    1999, Journal of Photopolymer Science and Technology, (12) 3, p.445-456
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    Status of ArF lithography for the 130nm technology node

    Ronse, Kurt  
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    Vandenberghe, Geert  
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    Jaenen, Patrick  
    ;
    Delvaux, Christie  
    Proceedings paper
    2000, Optical Microlithography XIII, 1/03/2000, p.410

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