Browsing by Author "Davies, G."
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Publication 193 nm lithography on a full field scanner
Proceedings paper1999, Optical Microlithography XII, 14/03/1999, p.278-289Publication Advanced 193 nm step and scan technology
;Stoeldraijer, J. ;Mulkens, J. ;Davies, G. ;Sytsma, J. ;Bakker, H. ;Glatzel, H. ;Wagner, C.Roempp, O.Meeting abstract1998, 4th International Symposium on 193 nm Lithography. Abstracts Book. "193nm '98. At the Peak", 14/09/1998Publication ArF step-and-scan exposure system for 0.15-μm and 0.13-μm technology nodes
;Mulkens, J. ;Stoeldraijer, J. ;Davies, G. ;Dierichs, M. ;Heskamp, B. ;Moers, M. H.George, R. A.Proceedings paper1999, Optical Microlithography XII, 14/03/1999, p.506-521Publication Introducing 193 nm lithography
Proceedings paper1998, Proceedings of the Microlithography Symposium. Interface '98, 15/11/1998, p.179-198Publication Lithographic performance of 193 nm resist
Proceedings paper1998, 193nm '98. At the Peak. 4th International Symposium on 193 nm Lithography. Abstracts Book, 14/09/1998, p.P-020Publication Recent advancements in 193 nm step and scan lithography
Journal article1999, Journal of Photopolymer Science and Technology, (12) 3, p.445-456Publication Status of ArF lithography for the 130nm technology node
Proceedings paper2000, Optical Microlithography XIII, 1/03/2000, p.410