Browsing by Author "De Silva, Anuja"
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Publication Dry Resist Metrology Readiness for High-NA EUVL
Proceedings paper2023, Conference on Metrology, Inspection, and Process Control XXXVII, FEB 27-MAR 02, 2023, p.Art. 1249612Publication E-beam metrology and line local critical dimension uniformity of thin dry resist films for high numerical aperture extreme ultraviolet lithography
Journal article2023, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (22) 4, p.Art. 044001Publication Improving OPC Model Accuracy of Dry Resist for Low k1 EUV Patterning
Proceedings paper2024, Conference on DTCO and Computational Patterning III, FEB 26-29, 2024, p.Art. 129540LPublication OPC Model Accuracy of Dry Resist Readiness for 0.55NA EUVL by using Low-n Bright Field Mask
Proceedings paper2025, 2025 Conference on DTCO and Computational Patterning, 2025-04-22, p.134250Y-1-134250Y-11Publication Resolution improvement and dose reduction in logic and memory applications from low NA to high NA
Proceedings paper2025, 2025 Conference on Optical and EUV Nanolithography, 2025-04-22, p.1