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Browsing by Author "Delmotte, Joris"

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    Advances in metrology for complex epitaxial systems embedded in small volums

    Vandervorst, Wilfried  
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    Kumar, Arul
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    Meersschaut, Johan  
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    Franquet, Alexis  
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    Douhard, Bastien  
    Meeting abstract
    2015-05, 9th International Conference on Silicon Epitaxy and Heterostructures - ICSI9, 18/05/2015, p.133-134
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    Cesium/xenon dual beam sputtering in a Cameca instrument

    Pureti, Rathaiah
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    Douhard, Bastien  
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    Delmotte, Joris
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    Merkulov, Alexandre
    Journal article
    2014, Surface and Interface Analysis, (46) S1, p.25-30
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    Composition measurements of thin films beyond the spatial resolution of SIMS

    Franquet, Alexis  
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    Douhard, Bastien  
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    Delmotte, Joris
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    Merckling, Clement  
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    Conard, Thierry  
    Meeting abstract
    2013, 19th International Conference on Secondary Ion Mass Spectrometry - SIMS19, 29/09/2013
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    Compressively strained SiGe band-to-band tunneling model calibration based on p-i-n diodes and prospects of strained SiGe tunneling field-effect transistors

    Kao, Frank  
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    Verhulst, Anne  
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    Rooyackers, Rita
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    Douhard, Bastien  
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    Delmotte, Joris
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    Bender, Hugo  
    Journal article
    2014, Journal of Applied Physics, (116) 21, p.214506
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    Depth resolution and surface transients in crystalline Silicon at ultra low energies

    Goossens, Jozefien
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    Berghmans, Bart
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    Franquet, Alexis  
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    Nguyen, Duy
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    Delmotte, Joris
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    Geenen, Luc
    Meeting abstract
    2009-09, 17th International Conference on Secondary Ion Mass Spectrometry - SIMS XVII, 14/08/2009, p.247
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    Direct physical evidence of mechanisms of leakage and equivalent oxide thickness reduction in metal-insulator-metal capacitors based on RuOx/TiOx/SrxTiyOz/TiN stacks

    Pawlak, Malgorzata
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    Swerts, Johan  
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    Popovici, Mihaela Ioana  
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    Kaczer, Ben  
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    Kim, Min-Soo  
    Journal article
    2012, Applied Physics Letters, (101) 4, p.42901
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    Dopant profiliing in textured structures for photovoltaic applications

    Vandervorst, Wilfried  
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    Douhard, Bastien  
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    Delmotte, Joris
    Oral presentation
    2011, 18th International Conference on Secondary Ion Mass Spectrometry - SIMS XXVIII
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    GeSn channel nMOSFETs: material potential and technological outlook

    Gupta, Somya
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    Vincent, Benjamin  
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    Lin, Dennis  
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    Gunji, M.
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    Firrincieli, Andrea  
    Proceedings paper
    2012, Symposium on VLSI Technology, 12/06/2012, p.95-96
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    MBE growth investigations of InxGa1-xAs/GaAsySb1-y systems for TFET performance prediction

    El Kazzi, Salim
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    Smets, Quentin  
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    Rooyackers, Rita
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    Delmotte, Joris
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    Geypen, Jef  
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    Verhulst, Anne  
    Meeting abstract
    2015, 18th European Molecular Beam Epitaxy Workshop - EUROMBE, 15/03/2015
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    Probing ultra thin Si passivation layers on Ge-substrates

    Vandervorst, Wilfried  
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    Douhard, Bastien  
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    Delmotte, Joris
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    Franquet, Alexis  
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    Vincent, Benjamin  
    Oral presentation
    2011, 18th International Conference on Secondary Ion Mass Spectrometry - SIMS XXVIII
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    Quantification of group IV alloys in confined structures: the self focusing SIMS approach

    Franquet, Alexis  
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    Douhard, Bastien  
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    Melkonyan, Davit
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    Delmotte, Joris
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    Demeulemeester, Jelle
    Meeting abstract
    2014, SIMS Europe, 7/09/2014
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    Record low contact resistivity to n-type Ge for CMOS and memory applications

    Martens, Koen  
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    Firrincieli, Andrea  
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    Rooyackers, Rita
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    Vincent, Benjamin  
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    Loo, Roger  
    Proceedings paper
    2010, IEEE International Electron Devices Meeting - IEDM, 6/12/2010
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    Si passivation for Ge pMOSFETs: impact of Si cap growth conditions

    Vincent, Benjamin  
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    Loo, Roger  
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    Vandervorst, Wilfried  
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    Delmotte, Joris
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    Douhard, Bastien  
    Journal article
    2011, Solid-State Electronics, (60) 1, p.116-121
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    Sims depth profiling with sub-nm resolution (?)

    Vandervorst, Wilfried  
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    Douhard, Bastien  
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    Delmotte, Joris
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    Vincent, Benjamin  
    Meeting abstract
    2011, International Workshop on High Resolution Depth Profiling - HRDP6, 27/06/2011, p.37-40
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    Simulation of the anneal of ion implanted boron emitter and the impact on the saturation current density

    Florakis, Antonios
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    Janssens, Tom
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    Rosseel, Erik  
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    Douhard, Bastien  
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    Delmotte, Joris
    Proceedings paper
    2012, 2nd International Conference on Crystalline Silicon Photovoltaics - Silicon PV, 3/05/2012, p.240-246
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    Simulation of the phosphorus profiles in a c-Si solar cell fabricated using POCl3 diffusion or ion implantation and annealing

    Florakis, Antonios
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    Janssens, Tom
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    Posthuma, Niels  
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    Delmotte, Joris
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    Douhard, Bastien  
    Proceedings paper
    2013, Proceedings of the 3rd International Conference on Silicon Photovoltaics - SiliconPV, 25/03/2013, p.263-269
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    Simulation of the post-implantation anneal for emitter profile optimization in high efficiency c-Si solar cells

    Florakis, Antonios
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    Vandervorst, Wilfried  
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    Janssens, Tom
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    Rosseel, Erik  
    ;
    Douhard, Bastien  
    Proceedings paper
    2012, Ion Implantation Technology. Proceedings of the 19th International Conference, 25/06/2012, p.206-211

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