Browsing by Author "Driessen, Frank"
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Publication A 65-nm node SRAM solution using alt-PSM with ArF lithography
Publication Aerial image simulations of soft and phase defects in 193-nm lithography for 10-nm node
Proceedings paper2002, Optical Microlithography XV, 5/03/2002, p.1180-1189Publication Complementary phase-shift mask towards 70-nm technology node
Proceedings paper2002, Optical Microlithography XV, 5/03/2002, p.AddendumPublication Extending ArF to the 65-nm node with full-phase lithography
Proceedings paper2003, Optical Microlithography XVI, 23/02/2003, p.1091-1102Publication Full phase-shifting methodology for 65-nm node lithography
Proceedings paper2003, Optical Microlithography XVI, 23/02/2003, p.282-293Publication Performance optimisation of the double exposure alternatin PSM for sub-100 nm ICs
Oral presentation2001, 21st Annual BACUS Symposium on Photomask Technology; October 2001; Monterey, CA, USA.Publication Performance optimization of the double-exposure alternating PSM for (sub-)100-nm ICs
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