Browsing by Author "Du, A.Y."

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High performance & CMOS integration friendly dual metal gate MOSFETs using TaN/Ru or TaN/W/Ru stacking multi-layers on HfLaO gate dielectric

Wang, X.P.
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Li, M.F.
;
Yu, HongYu
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Yang, J.J.
;
Loh, W.Y.
;
Zhu, C.X.
;
Du, A.Y.
;
Trigg, A.D.
;
Zhang, G.
Proceedings paper
2007, International Conference on Solid State Devices and Materials - SSDM, 18/09/2006
Practical solutions to enhance EWF tunability of Ni FUSI gate electrode on HfO2

Wang, X.P.
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Yang, J.J.
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Chen, J.D.
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Xie, R.L.
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Li, M.-F.
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Zhu, C.X.
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Yu, HongYu
;
Du, A.Y.
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Lim, P.C.
Proceedings paper
2007, International Conference on Solid State Devices and Materials - SSDM, 18/09/2007, p.854-855
Widely tunable work function TaN/Ru stacking layer on HfLaO gate dielectric

Wang, X.P.
;
Li, M.F.
;
Yu, HongYu
;
Yang, J.J.
;
Chen, J.D.
;
Zhu, C.X.
;
Du, A.Y.
;
Loh, W.Y.
Journal article
2008, IEEE Electron Device Letters, (29) 1, p.50-53