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Browsing by Author "Duriau, Edouard"

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    Analysis and modeling of the high vacuum scanning spreading resistance microscopy nanocontact on silicon

    Eyben, Pierre  
    ;
    Clemente, Francesca
    ;
    Vanstreels, Kris  
    ;
    Pourtois, Geoffrey  
    Journal article
    2010, Journal of Vacuum Science and Technology B, (28) 2, p.401-406
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    Analysis and modeling of the HV-SSRM nanocontact on silicon

    Eyben, Pierre  
    ;
    Clemente, Francesca
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    Vanstreels, Kris  
    ;
    Pourtois, Geoffrey  
    Meeting abstract
    2009, International Workshop on INSIGHT in Semiconductor Device Fabrication, Metrology and Modeling, 26/04/2009
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    Dopant/carrier profiling for sub-45nm technologies

    Vandervorst, Wilfried  
    ;
    Janssens, Tom
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    Eyben, Pierre  
    ;
    Duriau, Edouard
    Meeting abstract
    2005, 8th International Workshop on Fabrication, Characterization and Modeling of Ultra Shallow Junctions in Semiconductors, 5/06/2005
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    Fabrication of cantilevers and double AFM tips for the nanoprofiler

    Duriau, Edouard
    ;
    Clarysse, Trudo
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    Hantschel, Thomas  
    ;
    Vandervorst, Wilfried  
    Journal article
    2007, Microelectronic Engineering, (84) 5_8, p.1162-1167
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    Image contrast metrology for EUV lithography

    Brunner, Timothy A.
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    Truffert, Vincent  
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    Ausschnitt, Kit  
    ;
    Kissoon, Nicola N.
    ;
    Duriau, Edouard
    Proceedings paper
    2022-09-29, International Conference on Extreme UltraViolet Lithography, SEP 26-29, 2022, p.122920A
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    New SPM concept for accurate and repeatable tip positioning

    Duriau, Edouard
    ;
    Clarysse, Marc
    ;
    Moussa, Alain  
    ;
    Vanhaeren, Danielle  
    ;
    Eyben, Pierre  
    Journal article
    2009, Microelectronic Engineering, (86) 4_6, p.1234-1237
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    Validation of imaging benefits of Dual Monopole exposures

    Brunner, Timothy A.
    ;
    Franke, Joern-Holger
    ;
    Truffert, Vincent  
    ;
    De Bisschop, Peter  
    Proceedings paper
    2023, International Conference on Extreme Ultraviolet Lithography, OCT 02-05, 2023, p.Art. 1275006

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