Browsing by Author "Fedorenko, Yanina"
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Publication ALD La-based oxides for Vt-tuning in high-k/metal gate stacks
Proceedings paper2007, Atomic Layer Deposition Applications 3 Atomic Layer Deposition Applications 3, 7/10/2007, p.201-211Publication Atomic layer deposition of hafnium based gate dielectric layers for CMOS applications
Proceedings paper2007, Atomic Layer Deposition Applications 3, 7/10/2007, p.227-241Publication Atomic layer deposition of hafnium silicate from HfCl4, SiCl4, and H2O
Journal article2007, Electrochemical and Solid-State Letters, (10) 5, p.H149-H152Publication Atomic layer deposition of hafnium silicate gate dielectric layers
Journal article2007, Journal of Vacuum Science and Technology A, (25) 4, p.1302-1308Publication Impact of Hf-precursor choice on scaling and performance of high-k gate dielectrics
; ; ; ; Proceedings paper2007, Physics and Technology of High-k Gate Dielectrics 5, 7/10/2007, p.59-72