Browsing by Author "Foltin, Markus"
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Publication Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorber
Journal article2023, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (22) 2, p.Art. 024403Publication Mask absorber for next generation EUV lithography
Proceedings paper2020, Conference on Extreme Ultraviolet Lithography, SEP 21-25, 2020Publication Study of novel EUVL mask absorber candidates
Journal article2021, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (20) 2