Browsing by Author "Frank, Martin M."
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Publication Chemical and structural modifications in a 193-nm photoresist after low-k dry etch
Journal article2008, Thin Solid Films, (516) 11, p.3454-3459Publication Enhanced initial growth of atomic layer deposited metal oxides on hydrogen-terminated silicon
Journal article2003, Applied Physics Letters, (83) 4, p.740-742Publication Germanium surface conditioning and passivation
Publication Photoresist characterization and wet strip after low-k dry etch
Proceedings paper2008, Ultra Clean Processing of Semiconductor Surfaces VIII - UCPSS, 18/09/2006, p.325-328Publication Post ion-implant photoresist removal via wet chemical cleans combined with physical force pretreatments
Proceedings paper2007, Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10, 7/10/2007, p.219-226