Browsing by Author "Fu, X."
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Publication Effective work function engineering for aggressively scaled planar and FinFET-based devices with high-k last replacement metal gate technology
; ; ; Proceedings paper2012-09, International Conference on Solid State Devices and Materials - SSDM, 25/09/2012Publication Effective work function engineering for aggressively scaled planar and multi-gate fin field-effect transistor-based devices with high-k last replacement metal gate technology
; ; ; Journal article2013, Japanese Journal of Applied Physics, (52) 4, p.04CA02Publication III-V-on-silicon anti-colliding pulse-type mode-locked laser
Journal article2015-07, Optics Letters, (40) 13, p.3057-3060Publication Implementation of Ru based barriers in 50 nm half pitch single damascene Cu/SiCOH (k=2.5) structures
; ; ; ; Proceedings paper2009, Advanced Metallization Conference 2008 (AMC2008), 23/09/2008, p.91-97Publication Implementation of Ru based barriers in 50 nm half pitch single damascene Cu/SiCOH (k=2.5) structures
; ; ; ; Meeting abstract2008, Advanced Metallization Conference - AMC, 23/09/2008